ASML today announced that it has entered into a license agreement with Intel for several lithography patents that can be used to design or produce advanced masks. The licensing agreement includes ASML’s Scattering Bar Technology, which enhances the performance and value of ASML lithography systems by increasing the manufacturing process window and, thereby, contributing to higher yields or more useable chips per wafer.

ASML today announced that it has entered into a license agreement with Intel for several lithography patents that can be used to design or produce advanced masks. The licensing agreement includes ASML’s Scattering Bar Technology, which enhances the performance and value of ASML lithography systems by increasing the manufacturing process window and, thereby, contributing to higher yields or more useable chips per wafer.