During the Semicon West trade show, ASML Holding NV, Canon Inc. and Nikon Corp. separately tipped their roadmaps for immersion lithography. The three companies are racing each other to develop 193-nm systems with hyper numerical apertures (NA) of 1.3 for use in chip designs at 45-nm and below. Nikon disclosed some details about its next-generation machine dubbed the S6xx, the 193-nm immersion lithography tool featuring a “tandem-stage” design and a multi-axial catadioptric lens with an NA of 1.3. Shipments of the tool are slated for late 2006 or early 2007. ASML is also quietly developing the XT1900i, a 193-nm, immersion system with a hyper NA of 1.3. ASML was originally supposed to ship the XT1900i in late 2007, but is reportedly accelerating that schedule. Canon also tipped its first immersion tool, a 193-nm machine with a dual-stage design and a hyper NA of 1.3.

During the Semicon West trade show, ASML Holding NV, Canon Inc. and Nikon Corp. separately tipped their roadmaps for immersion lithography. The three companies are racing each other to develop 193-nm systems with hyper numerical apertures (NA) of 1.3 for use in chip designs at 45-nm and below. Nikon disclosed some details about its next-generation machine dubbed the S6xx, the 193-nm immersion lithography tool featuring a “tandem-stage” design and a multi-axial catadioptric lens with an NA of 1.3. Shipments of the tool are slated for late 2006 or early 2007. ASML is also quietly developing the XT1900i, a 193-nm, immersion system with a hyper NA of 1.3. ASML was originally supposed to ship the XT1900i in late 2007, but is reportedly accelerating that schedule. Canon also tipped its first immersion tool, a 193-nm machine with a dual-stage design and a hyper NA of 1.3.