Nvidia would manufacture some of its forthcoming GPUs on a 0.11-micron manufacturing process at foundry TSMC. No time-scale was given for when Nvidia products would be made on the 0.11-micron process, or for any subsequent move to 90-nm manufacturing process technology. TSMC began 0.11 micron high-performance technology development in 2002 and “qualified” the process in December of 2003. Yields have already reached production-worthy levels and the low-voltage version has already ramped into volume production. The general-purpose version of the 0.11-micron manufacturing process is set to enter “risk production” in the first quarter of 2005. TSMC’s 0.11-micron manufacturing process is a photolithographic shrink of its 0.13-micron process,. The process will be available in both high-performance and general-purpose versions using fluorinated silicate glass based dielectrics.

Nvidia would manufacture some of its forthcoming GPUs on a 0.11-micron manufacturing process at foundry TSMC. No time-scale was given for when Nvidia products would be made on the 0.11-micron process, or for any subsequent move to 90-nm manufacturing process technology. TSMC began 0.11 micron high-performance technology development in 2002 and “qualified” the process in December of 2003. Yields have already reached production-worthy levels and the low-voltage version has already ramped into volume production. The general-purpose version of the 0.11-micron manufacturing process is set to enter “risk production” in the first quarter of 2005. TSMC’s 0.11-micron manufacturing process is a photolithographic shrink of its 0.13-micron process,. The process will be available in both high-performance and general-purpose versions using fluorinated silicate glass based dielectrics.